- Neware
- Pine Research
- OKOndt Group
- Novocontrol
- Norecs
- METERTEST
- Microrad
- Metrel
- Labdex
- SDT
- micrux
- AARONIA AG
- ADASH
- Amptek
- AOiP
- AstroNova
- AWSensors
- Automatic Research
- BASI
- BRS
- Cmc
- CTRL
- CALMET
- CHECKLINE
- C-Tech
- DV Power
- DANATRONICS
- ECH
- Elsys
- Enervac
- Enapter
- ELVEFLOW
- EA Technology
- EL-CELL
- ENERGY SUPPORT
- Electrothermal
- FASTEC
- GE
- GMW
- Gaskatel
- GIUSSANI
- Globecore
- GREENLIGHT
- GRZ
- HTW
- HIGH SENSE SOLUTIONSHTW
- HUBER
- Labnics
- Ida
- LIQUID
- Instytut Fotonowy
- KEHUA TECH
- JGG
- HVPD
- Jenway
- Jacomex
- IVIUM
- ndb
- OZM
- Redoxme
- Serstech
- SATIR
- VacCoat
- Zurich
- Neware
- Pine Research
- OKOndt Group
- Novocontrol
- Norecs
- METERTEST
- Microrad
- Metrel
- Labdex
- SDT
- micrux
- AARONIA AG
- ADASH
- Amptek
- AOiP
- AstroNova
- AWSensors
- Automatic Research
- BASI
- BRS
- Cmc
- CTRL
- CALMET
- CHECKLINE
- C-Tech
- DV Power
- DANATRONICS
- ECH
- Elsys
- Enervac
- Enapter
- ELVEFLOW
- EA Technology
- EL-CELL
- ENERGY SUPPORT
- Electrothermal
- FASTEC
- GE
- GMW
- Gaskatel
- GIUSSANI
- Globecore
- GREENLIGHT
- GRZ
- HTW
- HIGH SENSE SOLUTIONSHTW
- HUBER
- Labnics
- Ida
- LIQUID
- Instytut Fotonowy
- KEHUA TECH
- JGG
- HVPD
- Jenway
- Jacomex
- IVIUM
- ndb
- OZM
- Redoxme
- Serstech
- SATIR
- VacCoat
- Zurich
脈衝雷射沉積和熱蒸發系統
PULSED LASER DEPOSITION AND THERMAL EVAPORATOR SYSTEM 型號:PLD-T脈衝類射沉積技術可實現高效率、非熱消熔,並保持目標材料的化學計量。通過應用這種方法,可以沉積氮化物、氧化物、超晶格、聚合物和復合材料等材料。
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多功能脈衝雷射沉積和熱蒸鍍系統 - PLD-T 是一種高真空薄膜沉積系統,可通過脈衝雷射沉積和熱蒸鍍技術沉積不同的材料。它可以將復雜的材料和晶體結構沉積到基底上,只需很少的設置。
脈衝類射沉積技術可實現高效率、非熱消熔,並保持目標材料的化學計量。通過應用這種方法,可以沉積氮化物、氧化物、超晶格、聚合物和復合材料等材料。
特點
- 可調節旋轉速度的靶操縱器。
- 3 個熱源和特殊饋通件。
- 石英晶體監測系統,用於即時厚度測量(精度 1 nm)。
- 視覺式的觸控螢幕,用於控制塗佈過程和快速輸入數據。
- 等離子清洗。
- 友善的用戶軟體介面,並可通過網路更新。
- 配備旋轉式樣品支架。
- 配備電子快門。
- 配備電動舟型選擇裝置。
- 500 °C 基底加熱器。
- Vac coat 產品在全球範圍內都有公共和產品責任保險,以防 Vac coat 系統造成任何財產損失或人身傷害。
熱蒸鍍源(舟型/籃型/線圈)
脈衝雷射沉積系統可配備三個獨立的熱電阻式熱蒸鍍源。蒸鍍源支架的良好設計不會導致污染從來源材料轉移到其它材料上。
來源材料的支架的長度可在 5-10 cm範圍內調節,以滿足客戶的要求。靶操縱器
PLD 配備了一個多靶操縱器,其中包括三個直徑為 2 厘米的靶。所有的靶材尺寸都是為標準尺寸。同時,所有的靶操縱器都是電動的,包括靶的旋轉。
彩色觸控螢幕控制
脈衝雷射沉積系統 PLD-T配備 7”彩色觸控螢幕,具有全自動控制和數據輸入功能,即使沒有經驗的用戶也能操作。真空、電流和沈積訊息可通過觸控螢幕上以數值資料或曲線的形式顯示。最後 300 次濺鍍資訊都可儲存在歷史紀錄頁上。
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- High vacuum turbomolecular pump
- Diaphragm backing pump
- Full range vacuum measuring gauge
- 5 KW high current power supply
- Precision Mass Flow meter (MFC)
- Able to record and plot coating parameters graphs
- Transfers the curves and deposition process data by USB port to PC
- Utilities: 220V-240V, 50/60HZ, 16A
- Box Dimensions: 50 cm H x 60 cm W x 47 cm D
- Shipping weight: 70 kg
泵壓速率 90 l/s 350 l/s 極限壓力 7 x10-6 Torr 7×10-7 Torr
Options and Accessories- The PLD-T has the following options and accessories:
- Thermal evaporation sources (Boat/Basket/Coil)
- 500 °C substrate heater
- Evaporation sources materials
- Quartz crystal sensors
- Sealing gaskets
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Versatile Pulsed Laser Deposition and Thermal Evaporator System – PLD-T is a high vacuum thin film deposition system enables to deposit different materials by both Pulsed Laser Deposition and so Thermal Evaporation technique. It can deposit complex materials and crystalline structures onto substrates with very little setup involved.
Pulsed Laser Deposition technique leads to efficient, none-thermal ablation and preserves the stoichiometry of the target materials. By applying this method it could deposit materials such as nitrides, oxides, super lattices, polymers, and compositesFeatures
- Target manipulator with adjustable rotation speed
- 3 thermal sources and special feedthrough
- Quartz crystal monitoring system for real time thickness measurement (1 nm precision)
- Intuitive touch screen to control the coating process and rapid data input
- Plasma Cleaning
- User friendly software that can be updated via network
- Equipped with rotary sample holder
- Equipped with electronic shutter
- Equipped to motorized boat selection
- 500 °C substrate heater
- Vac coat Products are covered worldwide by both public and product Liability Insurance in case any property damage or personal injury happens caused by the Vac Coat systems.
Thermal Evaporation Sources (Boat/Basket/Coil)
The Pulsed Laser Deposition System can be fitted with three independent heat resistance thermal evaporation sources. The good design of the evaporation source holder causes no contamination transfer from sources materials to other materials. The length of source holders can be adjusted in the range of 5~10 cm which meets the costumer requirement.Target Manipulator
PLD is equipped with a multi-target manipulator which includes three target with diameter of 2cm. Targets are in standard size and all of our target manipulators are motorized and includes target rotation.Touch Screen Control with Colorful Display
The pulsed laser deposition system, PLD-T, is equipped with a 7” colored touch screen and fully automatic control and data input that can be operated by even inexperienced users. The vacuum, current, and deposition information can be observed as digital data or curves on the touchscreen. Information of the last 300 coatings can be saved in the history page. -
- High vacuum turbomolecular pump
- Diaphragm backing pump
- Full range vacuum measuring gauge
- 5 KW high current power supply
- Precision Mass Flow meter (MFC)
- Able to record and plot coating parameters graphs
- Transfers the curves and deposition process data by USB port to PC
- Utilities: 220V-240V, 50/60HZ, 16A
- Box Dimensions: 50 cm H x 60 cm W x 47 cm D
- Shipping weight: 70 kg
Pumping Speed 90 l/s 350 l/s Ultimate Pressure 7 x10-6 Torr 7×10-7 Torr
Options and Accessories- The PLD-T has the following options and accessories:
- Thermal evaporation sources (Boat/Basket/Coil)
- 500 °C substrate heater
- Evaporation sources materials
- Quartz crystal sensors
- Sealing gaskets